ALD
Atomic-Mega
Thermal ALD Process
- System Specification
- Vertical Furnace Type Batch ALD
- Substrate Size : 4 ~ 12” Standard (Wafer)
- Product Wafer : 25 EA/ 50 EA (Up to 100 EA)
- Boat Slot Pitch : 10 ~ 15 mm
- Boat Elevation System for Wafer Loading
- Up/Down & Wafer Rotation
- Manual / Automatic Wafer Transfer
- Furnace Heater : Zone Temperature Control
- Process Temperature : 400 ℃ ~ 800 ℃
- Ramping-Up : > 10 ℃/min
- Ramping-Down : 2 ~ 3.3 ℃/min
View

- Atomic Mega
- Detail